SPECTROSCOPIC ANALYSIS DEVICE, OPTICAL SYSTEM, AND METHOD

A spectroscopic analysis device (1) includes: a film (3) configured to contact a sample (S) subject to spectroscopic analysis; a first irradiator (10) configured to irradiate a first irradiation light (L1) having a transition energy configured to decompose material attached to a boundary surface of...

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Bibliographic Details
Main Authors Hara, Risa, Watanabe, Fumie, Murayama, Kodai, Saruya, Toshiyuki
Format Patent
LanguageEnglish
French
German
Published 02.03.2022
Subjects
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Summary:A spectroscopic analysis device (1) includes: a film (3) configured to contact a sample (S) subject to spectroscopic analysis; a first irradiator (10) configured to irradiate a first irradiation light (L1) having a transition energy configured to decompose material attached to a boundary surface of the film; and an optical waveguide (2) configured to transmit the first irradiation light (L1) irradiated from the first irradiator (10). A first evanescent wave, based on the first irradiation light (L1), is generated on a front surface (2a, 2c) of the optical waveguide (2), and is then projected on a region of the attached material.
Bibliography:Application Number: EP20210193094