METHOD FOR MEASURING AND CORRECTING MISREGISTRATION BETWEEN LAYERS IN A SEMICONDUCTOR DEVICE, AND MISREGISTRATION TARGETS USEFUL THEREIN
A method for measurement of misregistration in the manufacture of semiconductor device wafers, the method including measuring misregistration between layers of a semiconductor device wafer at a first instance and providing a first misregistration indication, measuring misregistration between layers...
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| Main Authors | , , , , , |
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| Format | Patent |
| Language | English French German |
| Published |
09.02.2022
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| Subjects | |
| Online Access | Get full text |
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| Abstract | A method for measurement of misregistration in the manufacture of semiconductor device wafers, the method including measuring misregistration between layers of a semiconductor device wafer at a first instance and providing a first misregistration indication, measuring misregistration between layers of a semiconductor device wafer at a second instance and providing a second misregistration indication, providing a misregistration measurement difference output in response to a difference between the first misregistration indication and the second misregistration indication, providing a baseline difference output and ameliorating the difference between the misregistration measurement difference output and the baseline difference output. |
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| AbstractList | A method for measurement of misregistration in the manufacture of semiconductor device wafers, the method including measuring misregistration between layers of a semiconductor device wafer at a first instance and providing a first misregistration indication, measuring misregistration between layers of a semiconductor device wafer at a second instance and providing a second misregistration indication, providing a misregistration measurement difference output in response to a difference between the first misregistration indication and the second misregistration indication, providing a baseline difference output and ameliorating the difference between the misregistration measurement difference output and the baseline difference output. |
| Author | VOLKOVICH, Roie YERUSHALMI, Liran ZABERCHIK, Moran MILO, Renan FELER, Yoel IZRAELI, David |
| Author_xml | – fullname: MILO, Renan – fullname: FELER, Yoel – fullname: VOLKOVICH, Roie – fullname: ZABERCHIK, Moran – fullname: IZRAELI, David – fullname: YERUSHALMI, Liran |
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| DocumentTitleAlternate | VERFAHREN ZUR MESSUNG UND KORREKTUR VON FEHLREGISTRIERUNGEN ZWISCHEN SCHICHTEN IN EINEM HALBLEITERBAUELEMENT UND FEHLREGISTRIERUNGSZIELE DAFÜR PROCÉDÉ DE MESURE ET DE CORRECTION D'UN DÉFAUT D'ALIGNEMENT ENTRE DES COUCHES DANS UN DISPOSITIF À SEMI-CONDUCTEUR, ET CIBLES DE DÉFAUT D'ALIGNEMENT UTILES DANS CELUI-CI |
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| Notes | Application Number: EP20190921663 |
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| Snippet | A method for measurement of misregistration in the manufacture of semiconductor device wafers, the method including measuring misregistration between layers of... |
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| SubjectTerms | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| Title | METHOD FOR MEASURING AND CORRECTING MISREGISTRATION BETWEEN LAYERS IN A SEMICONDUCTOR DEVICE, AND MISREGISTRATION TARGETS USEFUL THEREIN |
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