METROLOGY SYSTEM AND METHOD FOR MEASURING AN EXCITATION LASER BEAM IN AN EUV PLASMA SOURCE
A metrology system includes a first beam analysis system for analyzing at least one first measurement beam that was coupled from the excitation laser beam before a reflection on the target material and a second beam analysis system for analyzing at least one second measurement beam that was coupled...
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Main Authors | , |
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Format | Patent |
Language | English French German |
Published |
29.11.2023
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Subjects | |
Online Access | Get full text |
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