COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL

A method for determining a correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selec...

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Main Authors LAMBREGTS, Cornelis, Johannes, Henricus, GROUWSTRA, Cédric, Désiré, RIJPSTRA, Manouk, ROY, Sarathi, KOU, Weitian, TEL, Wim, Tjibbo, NIEN, Chi-Fei, CHEN, Chang-Wei, SMORENBERG, Pieter, Gerardus, Jacobus
Format Patent
LanguageEnglish
French
German
Published 28.10.2020
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Abstract A method for determining a correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selecting, by a hardware computer system, a representative quality from the plurality of qualities, and determining, by the hardware computer system, a correction to the patterning process based on the representative quality.
AbstractList A method for determining a correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selecting, by a hardware computer system, a representative quality from the plurality of qualities, and determining, by the hardware computer system, a correction to the patterning process based on the representative quality.
Author GROUWSTRA, Cédric, Désiré
CHEN, Chang-Wei
RIJPSTRA, Manouk
NIEN, Chi-Fei
ROY, Sarathi
LAMBREGTS, Cornelis, Johannes, Henricus
KOU, Weitian
TEL, Wim, Tjibbo
SMORENBERG, Pieter, Gerardus, Jacobus
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– fullname: KOU, Weitian
– fullname: TEL, Wim, Tjibbo
– fullname: NIEN, Chi-Fei
– fullname: CHEN, Chang-Wei
– fullname: SMORENBERG, Pieter, Gerardus, Jacobus
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Snippet A method for determining a correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a...
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SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Title COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL
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