ION BEAM SPUTTERING APPARATUS AND METHOD
An ion beam sputtering apparatus comprising: an ion source configured to generate a hollow ion beam along a beam axis that is located in a hollow part of the beam; and a sputtering target having a target body that defines at least one target surface, the target body comprising sputterable particles,...
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Main Authors | , , , |
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Format | Patent |
Language | English French German |
Published |
13.10.2021
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Subjects | |
Online Access | Get full text |
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