METHOD FOR MANUFACTURING A MONOCRYSTALLINE STRUCTURE
A substrate is provided with a monocrystalline silicon-germanium layer with a first surface covered by a protective oxide obtained by wet process and having a degradation temperature. The protective oxide is transformed into fluorinated salt which is then eliminated. The substrate is placed in a pro...
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Main Authors | , , , , |
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Format | Patent |
Language | English French German |
Published |
28.08.2024
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Subjects | |
Online Access | Get full text |
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