FABRICATION OF OPTICS WAFER

Fabricating an optics wafer includes providing a wafer (8) comprising a core region (9) composed of a glass-reinforced epoxy, the wafer (8) further comprising a first resin layer (10A) on a top surface of the core region (9) and a second resin layer (10B) on a bottom surface of the core region (9)....

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Main Author RUDMANN, Hartmut
Format Patent
LanguageEnglish
French
German
Published 14.10.2020
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Abstract Fabricating an optics wafer includes providing a wafer (8) comprising a core region (9) composed of a glass-reinforced epoxy, the wafer (8) further comprising a first resin layer (10A) on a top surface of the core region (9) and a second resin layer (10B) on a bottom surface of the core region (9). The core region (9) and first and second resin layers (10A,10B) are substantially non-transparent for a specific range of the electromagnetic spectrum. The wafer (8) further includes vertical transparent regions (6) that extend through the core region (9) and the first and second resin layers (10A,10B) and are composed of a material that is substantially transparent for the specific range of the electromagnetic spectrum. The wafer (8) is thinned, for example by polishing, from its top surface and its bottom surface so that a resulting thickness is within a predetermined range without causing glass fibers of the core region (9) to become exposed. Respective optical structures are provided on one or more exposed surfaces of at least some of the transparent regions (6).
AbstractList Fabricating an optics wafer includes providing a wafer (8) comprising a core region (9) composed of a glass-reinforced epoxy, the wafer (8) further comprising a first resin layer (10A) on a top surface of the core region (9) and a second resin layer (10B) on a bottom surface of the core region (9). The core region (9) and first and second resin layers (10A,10B) are substantially non-transparent for a specific range of the electromagnetic spectrum. The wafer (8) further includes vertical transparent regions (6) that extend through the core region (9) and the first and second resin layers (10A,10B) and are composed of a material that is substantially transparent for the specific range of the electromagnetic spectrum. The wafer (8) is thinned, for example by polishing, from its top surface and its bottom surface so that a resulting thickness is within a predetermined range without causing glass fibers of the core region (9) to become exposed. Respective optical structures are provided on one or more exposed surfaces of at least some of the transparent regions (6).
Author RUDMANN, Hartmut
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DocumentTitleAlternate HERSTELLUNG EINES OPTIKWAFERS
FABRICATION D'UNE TRANCHE OPTIQUE
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  year: 2020
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RelatedCompanies Heptagon Micro Optics Pte. Ltd
RelatedCompanies_xml – name: Heptagon Micro Optics Pte. Ltd
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Snippet Fabricating an optics wafer includes providing a wafer (8) comprising a core region (9) composed of a glass-reinforced epoxy, the wafer (8) further comprising...
SourceID epo
SourceType Open Access Repository
SubjectTerms BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCESIN A PLASTIC STATE
SEMICONDUCTOR DEVICES
TRANSPORTING
WORKING OF PLASTICS
WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Title FABRICATION OF OPTICS WAFER
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