FEEDBACK CONTROL BY RF WAVEFORM TAILORING FOR ION ENERGY DISTRIBUTION

A system for controlling RF power supplies applying power to a load, such as a plasma chamber, includes a master power supply and a slave power supply. The master power supply provides a control signal, such as a frequency and phase signal, to the slave power supply. The slave power supply receives...

Full description

Saved in:
Bibliographic Details
Main Authors COUMOU, David J, REINHARDT, Ross, GILL, Daniel M, PHAM, Richard, ELNER, Yuriy
Format Patent
LanguageEnglish
French
German
Published 26.10.2022
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
Online AccessGet full text

Cover

Be the first to leave a comment!
You must be logged in first