PURIFICATION OF CHLOROSILANES BY MEANS OF DISTILLATION AND ADSORPTION
Separation of chlorosilane mixtures containing boron, arsenic, and/or phosphorus impurities is facilitated by a distillative separation using at least one divided column, with recycle streams to a first column being passed through an external absorbent for the impurities.
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Main Authors | , , |
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Format | Patent |
Language | English French German |
Published |
01.05.2019
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Abstract | Separation of chlorosilane mixtures containing boron, arsenic, and/or phosphorus impurities is facilitated by a distillative separation using at least one divided column, with recycle streams to a first column being passed through an external absorbent for the impurities. |
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AbstractList | Separation of chlorosilane mixtures containing boron, arsenic, and/or phosphorus impurities is facilitated by a distillative separation using at least one divided column, with recycle streams to a first column being passed through an external absorbent for the impurities. |
Author | PAETZOLD, Uwe AIGNER, Maximilian PROCHASKA, Jan |
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DocumentTitleAlternate | PURIFICATION DE CHLOROSILANES PAR DISTILLATION ET ADSORPTION REINIGUNG VON CHLORSILANEN MITTELS DESTILLATION UND ADSORPTION |
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RelatedCompanies | Wacker Chemie AG |
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Snippet | Separation of chlorosilane mixtures containing boron, arsenic, and/or phosphorus impurities is facilitated by a distillative separation using at least one... |
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Title | PURIFICATION OF CHLOROSILANES BY MEANS OF DISTILLATION AND ADSORPTION |
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