SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

A semiconductor substrate (SUB), an insulating layer (BOX) made of silicon oxide formed on the semiconductor substrate and a semiconductor layer (SL) made of silicon formed on the insulating layer are provided, and the semiconductor layer constitutes an optical waveguide (PO) in an optical signal tr...

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Bibliographic Details
Main Authors INADA, Atsuro, WATANUKI, Shinichi
Format Patent
LanguageEnglish
French
German
Published 03.01.2018
Subjects
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
FREQUENCY-CHANGING
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICAL LOGIC ELEMENTS
OPTICS
PHYSICS
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Summary:A semiconductor substrate (SUB), an insulating layer (BOX) made of silicon oxide formed on the semiconductor substrate and a semiconductor layer (SL) made of silicon formed on the insulating layer are provided, and the semiconductor layer constitutes an optical waveguide (PO) in an optical signal transmission line section (A) and an optical modulator in an optical modulation section (B). Also, the insulating layer (BOX) is removed except for a part thereof to have a hollow structure with a cavity, and both side surfaces and a lower surface of each of the semiconductor layers constituting the optical waveguide and the optical modulator are exposed and covered with air.
Bibliography:Application Number: EP20160162130