DEPOSITION METHOD, DEPOSITION APPARATUS, AND STRUCTURE

A deposition method includes: introducing a gas into an airtight container containing electrically insulated raw material particles to generate an aerosol of the raw material particles; transferring the aerosol to a deposition chamber through a transfer tubing connected to the airtight container, th...

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Main Authors TOKIZAKI, EIJI, FUCHITA, EIJI, OZAWA, EIICHI
Format Patent
LanguageEnglish
French
German
Published 30.12.2015
Subjects
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Abstract A deposition method includes: introducing a gas into an airtight container containing electrically insulated raw material particles to generate an aerosol of the raw material particles; transferring the aerosol to a deposition chamber through a transfer tubing connected to the airtight container, the deposition chamber having a pressure maintained to be lower than that of the airtight container; injecting the aerosol from a nozzle mounted on a tip of the transfer tubing toward a target placed on the deposition chamber to cause the raw material particles to collide with the target, thereby causing the raw material particles to be positively charged; generating fine particles of the raw material particles by discharge of the charged raw material particles; and depositing the fine particles on a substrate placed on the deposition chamber.
AbstractList A deposition method includes: introducing a gas into an airtight container containing electrically insulated raw material particles to generate an aerosol of the raw material particles; transferring the aerosol to a deposition chamber through a transfer tubing connected to the airtight container, the deposition chamber having a pressure maintained to be lower than that of the airtight container; injecting the aerosol from a nozzle mounted on a tip of the transfer tubing toward a target placed on the deposition chamber to cause the raw material particles to collide with the target, thereby causing the raw material particles to be positively charged; generating fine particles of the raw material particles by discharge of the charged raw material particles; and depositing the fine particles on a substrate placed on the deposition chamber.
Author TOKIZAKI, EIJI
OZAWA, EIICHI
FUCHITA, EIJI
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Snippet A deposition method includes: introducing a gas into an airtight container containing electrically insulated raw material particles to generate an aerosol of...
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SubjectTerms ADHESIVES
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
ATOMISING APPARATUS
BASIC ELECTRIC ELEMENTS
CHEMICAL PAINT OR INK REMOVERS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
CORRECTING FLUIDS
DIFFUSION TREATMENT OF METALLIC MATERIAL
DYES
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
FILLING PASTES
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
INKS
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
NOZZLES
PAINTS
PASTES OR SOLIDS FOR COLOURING OR PRINTING
PERFORMING OPERATIONS
POLISHES
PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL
SPRAYING APPARATUS
SPRAYING OR ATOMISING IN GENERAL
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
TRANSPORTING
USE OF MATERIALS THEREFOR
WOODSTAINS
Title DEPOSITION METHOD, DEPOSITION APPARATUS, AND STRUCTURE
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