METHOD FOR DETERMINING A DISTANCE BETWEEN TWO BEAMLETS IN A MULTI-BEAMLET EXPOSURE APPARATUS

The invention relates to a method for determining a distance between two charged particle beamlets in a multi-beamlet exposure apparatus. The apparatus is provided with a sensor comprising a converter element for converting the energy of charged particles into light and a light sensitive detector. T...

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Bibliographic Details
Main Author MEIJER, Jan Andries
Format Patent
LanguageEnglish
French
German
Published 01.04.2020
Subjects
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