CONTROLLING PIT FORMATION IN A III-NITRIDE DEVICE
A device includes a semiconductor structure comprising a III-nitride light emitting layer disposed between an n-type region and a p-type region and a plurality of layer pairs disposed within one of the n-type region and the p-type region. Each layer pair includes an InGaN layer and pit-filling layer...
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Main Authors | , , |
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Format | Patent |
Language | English French German |
Published |
29.11.2017
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Subjects | |
Online Access | Get full text |
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