SEMICONDUCTOR STRUCTURE INCLUDING TRENCH CAPACITOR AND TRENCH RESISTOR
A structure and a method for fabrication of the structure use a capacitor trench for a trench capacitor and a resistor trench for a trench resistor. The structure is typically a semiconductor structure. In a first instance, the capacitor trench has a linewidth dimension narrower than the resistor tr...
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| Main Authors | , |
|---|---|
| Format | Patent |
| Language | English French German |
| Published |
25.08.2010
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| Subjects | |
| Online Access | Get full text |
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| Abstract | A structure and a method for fabrication of the structure use a capacitor trench for a trench capacitor and a resistor trench for a trench resistor. The structure is typically a semiconductor structure. In a first instance, the capacitor trench has a linewidth dimension narrower than the resistor trench. The trench linewidth difference provides an efficient method for fabricating the trench capacitor and the trench resistor. In a second instance, the trench resistor comprises a conductor material at a periphery of the resistor trench and a resistor material at a central portion of the resistor trench. |
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| AbstractList | A structure and a method for fabrication of the structure use a capacitor trench for a trench capacitor and a resistor trench for a trench resistor. The structure is typically a semiconductor structure. In a first instance, the capacitor trench has a linewidth dimension narrower than the resistor trench. The trench linewidth difference provides an efficient method for fabricating the trench capacitor and the trench resistor. In a second instance, the trench resistor comprises a conductor material at a periphery of the resistor trench and a resistor material at a central portion of the resistor trench. |
| Author | CHENG, KANGGUO RASSEL, ROBERT, M |
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| DocumentTitleAlternate | HALBLEITERSTRUKTUR MIT EINEM GRABENKONDENSATOR UND GRABENWIDERSTAND STRUCTURE À SEMICONDUCTEUR COMPRENANT UN CONDENSATEUR DE TRANCHÉE ET UNE RÉSISTANCE DE TRANCHÉE |
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| Notes | Application Number: EP20070710011 |
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| PublicationDecade | 2010 |
| PublicationYear | 2010 |
| RelatedCompanies | INTERNATIONAL BUSINESS MACHINES CORPORATION |
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| Snippet | A structure and a method for fabrication of the structure use a capacitor trench for a trench capacitor and a resistor trench for a trench resistor. The... |
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| SubjectTerms | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| Title | SEMICONDUCTOR STRUCTURE INCLUDING TRENCH CAPACITOR AND TRENCH RESISTOR |
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