METHOD AND APPARATUS HAVING A RETICLE STAGE SAFETY FEATURE

An apparatus and method are disclosed having a stage reticle safety feature. The apparatus includes a reticle stage and an optical stage. The reticle stage supports a reticle and is capable of moving the reticle in x-y-z directions. The optical stage includes a plurality of components to direct ligh...

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Bibliographic Details
Main Author PHILLIPS, ALTON HUGH
Format Patent
LanguageEnglish
French
German
Published 21.07.2010
Subjects
ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Abstract An apparatus and method are disclosed having a stage reticle safety feature. The apparatus includes a reticle stage and an optical stage. The reticle stage supports a reticle and is capable of moving the reticle in x-y-z directions. The optical stage includes a plurality of components to direct light reflected from the reticle onto a wafer substrate and a safety mechanism to move one or more components of the optical stage away from the reticle stage.
AbstractList An apparatus and method are disclosed having a stage reticle safety feature. The apparatus includes a reticle stage and an optical stage. The reticle stage supports a reticle and is capable of moving the reticle in x-y-z directions. The optical stage includes a plurality of components to direct light reflected from the reticle onto a wafer substrate and a safety mechanism to move one or more components of the optical stage away from the reticle stage.
Author PHILLIPS, ALTON HUGH
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Chemistry
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Physics
DocumentTitleAlternate VERFAHREN UND VORRICHTUNG MIT EINEM RETIKELSTUFENSICHERHEITSMERKMAL
PROCEDE ET APPAREIL COMPRENANT UN DISPOSITIF DE SECURITE AU NIVEAU DU RETICULE
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RelatedCompanies NIKON CORPORATION
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Snippet An apparatus and method are disclosed having a stage reticle safety feature. The apparatus includes a reticle stage and an optical stage. The reticle stage...
SourceID epo
SourceType Open Access Repository
SubjectTerms ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Title METHOD AND APPARATUS HAVING A RETICLE STAGE SAFETY FEATURE
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