DEVICE AND METHOD FOR SPUTTERING WITH THE AID OF A DISPLACEABLE PLANAR TARGET
The invention relates to a device for atomising material in a vacuum chamber with the aid of a displaceable target device (1) comprising a planar target (2) which can be switched as a cathode and which can be displaced on a plane. The inventive device comprises a stationary target environment (16),...
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Main Authors | , , |
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Format | Patent |
Language | English French German |
Published |
09.02.2011
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Subjects | |
Online Access | Get full text |
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