BURIED HETEROSTRUCTURE DEVICE FABRICATED BY SINGLE STEP MOCVD
The device is an optoelectronic device or transparent waveguide device that comprises a growth surface, a growth mask, an optical waveguide core mesa and a cladding layer. The growth mask is located on the semiconductor surface and defines an elongate growth window. The optical waveguide core mesa i...
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Format | Patent |
Language | English French German |
Published |
24.08.2011
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Abstract | The device is an optoelectronic device or transparent waveguide device that comprises a growth surface, a growth mask, an optical waveguide core mesa and a cladding layer. The growth mask is located on the semiconductor surface and defines an elongate growth window. The optical waveguide core mesa is located in the growth window and has a trapezoidal cross-sectional shape. The cladding layer covers the optical waveguide core mesa and extends over at least part of the growth mask. Such devices are fabricated by providing a wafer comprising a growth surface, growing an optical waveguide core mesa on the growth surface by micro-selective area growth at a first growth temperature and covering the optical waveguide core mesa with cladding material at a second growth temperature, lower than the first growth temperature. |
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AbstractList | The device is an optoelectronic device or transparent waveguide device that comprises a growth surface, a growth mask, an optical waveguide core mesa and a cladding layer. The growth mask is located on the semiconductor surface and defines an elongate growth window. The optical waveguide core mesa is located in the growth window and has a trapezoidal cross-sectional shape. The cladding layer covers the optical waveguide core mesa and extends over at least part of the growth mask. Such devices are fabricated by providing a wafer comprising a growth surface, growing an optical waveguide core mesa on the growth surface by micro-selective area growth at a first growth temperature and covering the optical waveguide core mesa with cladding material at a second growth temperature, lower than the first growth temperature. |
Author | CORZINE, SCOTT, W BOUR, DAVID, P |
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DocumentTitleAlternate | DISPOSITIF A STRUCTURE ENTERREE FABRIQUE EN UNE SEUL ETAPE DE DEPOSITION CHIMIQUE METAL-OXYDE EN PHASE VAPEUR DURCH EINSCHRITT-MOCVD HERGESTELLTES VERGRABENE-HETEROSTRUKTUR-BAUELEMENT |
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RelatedCompanies | AVAGO TECHNOLOGIES FIBER IP (SINGAPORE) PTE. LTD |
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Snippet | The device is an optoelectronic device or transparent waveguide device that comprises a growth surface, a growth mask, an optical waveguide core mesa and a... |
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SubjectTerms | BASIC ELECTRIC ELEMENTS DEVICES USING STIMULATED EMISSION ELECTRICITY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS |
Title | BURIED HETEROSTRUCTURE DEVICE FABRICATED BY SINGLE STEP MOCVD |
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