DEPOSITION METHOD USING A THERMAL PLASMA EXPANDED BY A REPLACEABLE PLATE
The present invention provides a deposition process for plasma enhanced chemical vapor deposition of a coating on a substrate. The process comprises detennining a target process condition within a chamber of an expanding thermal plasma generator; the generator comprising a cathode, a replaceable cas...
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Main Authors | , , |
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Format | Patent |
Language | English French German |
Published |
17.12.2008
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Abstract | The present invention provides a deposition process for plasma enhanced chemical vapor deposition of a coating on a substrate. The process comprises detennining a target process condition within a chamber of an expanding thermal plasma generator; the generator comprising a cathode, a replaceable cascade plate and an anode comprising a concentric orifice; and thereafter replacing the cascade plate with another plate having a configured orifice to effect the identified target process condition. The plasma is then generated at the target process condition by providing a plasma gas to the plasma generator and ionizing the plasma gas in an arc between cathode and anode within the generator and expanding the gas as a plasma onto a substrate in a deposition chamber. |
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AbstractList | The present invention provides a deposition process for plasma enhanced chemical vapor deposition of a coating on a substrate. The process comprises detennining a target process condition within a chamber of an expanding thermal plasma generator; the generator comprising a cathode, a replaceable cascade plate and an anode comprising a concentric orifice; and thereafter replacing the cascade plate with another plate having a configured orifice to effect the identified target process condition. The plasma is then generated at the target process condition by providing a plasma gas to the plasma generator and ionizing the plasma gas in an arc between cathode and anode within the generator and expanding the gas as a plasma onto a substrate in a deposition chamber. |
Author | IACOVANGELO, CHARLES, DOMINIC MIEBACH, THOMAS SCHAEPKENS, MARK |
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DocumentTitleAlternate | ABSCHEIDEVERFAHREN MIT EINEM THERMISCHEN PLASMA DAS MIT EINER ERSETZBAREN PLATTE EXPANDIERT WIRD PROCÉDÉ DE DÉPÔT PAR PLASMA THERMIQUE, DÉTENDU PAR UNE PLAQUE REMPLACABLE |
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Notes | Application Number: EP20040783129 |
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RelatedCompanies | SABIC INNOVATIVE PLASTICS IP B.V |
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Snippet | The present invention provides a deposition process for plasma enhanced chemical vapor deposition of a coating on a substrate. The process comprises... |
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SubjectTerms | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
Title | DEPOSITION METHOD USING A THERMAL PLASMA EXPANDED BY A REPLACEABLE PLATE |
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