FLUOROCOPOLYMER, PROCESS FOR PRODUCING THE SAME, AND RESIST COMPOSITION CONTAINING THE SAME

• Main Authors: TAKEBE, YOKO, YOKOKOJI, OSAMU, EDA, MASATAKA
• Format: Patent
• Language: English; French; German
• Published: 17.05.2006
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluorinated copolymer having units derived from a monomer unit formed by cyclopolymerization of a fluorinated diene represented by the following formula (1) : €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒCF 2 =CFCH 2 CH(CH 2 C(CF 3 ) 2 (OR 1 )) CH 2 CH=CH 2 €ƒ€ƒ€ƒ€ƒ€ƒ(1) wherein R 1 is a hydrogen atom, an alkyl group having at most 20 carbon atoms, which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CH 2 R 2 (wherein R 2 is an alkoxycarbonyl group having at most 6 carbon atoms), and units derived from a monomer unit formed by cyclopolymerization of another monomer or units derived from a monomer unit formed by polymerization of an acrylic monomer, and a resist composition having such a fluorinated copolymer as a base polymer.