DEFECT INSPECTION METHODS THAT INCLUDE ACQUIRING AERIAL IMAGES OF A RETICLE FOR DIFFERENT LITHOGRAPHIC PROCESS VARIABLES
Methods that include acquiring aerial images of a reticle for different values of a member of a set of lithographic variables are provided. One method also includes determining a presence of an anomaly in a design pattern of the reticle by comparing at least one pair of the aerial images correspondi...
Saved in:
Main Authors | , , |
---|---|
Format | Patent |
Language | English French German |
Published |
21.12.2016
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Abstract | Methods that include acquiring aerial images of a reticle for different values of a member of a set of lithographic variables are provided. One method also includes determining a presence of an anomaly in a design pattern of the reticle by comparing at least one pair of the aerial images corresponding to at least two of the different values. A different method includes comparing at least one pair of the aerial images corresponding to at least two of the different values and determining an area on the reticle where a lithography process using the reticle is most susceptible to failure based on the results of the comparison. Another embodiment includes determining a presence of transient repeating defects on the reticle by subtracting non-transient defects from the aerial images and comparing at least one pair of the aerial images corresponding to at least two of the different values. |
---|---|
AbstractList | Methods that include acquiring aerial images of a reticle for different values of a member of a set of lithographic variables are provided. One method also includes determining a presence of an anomaly in a design pattern of the reticle by comparing at least one pair of the aerial images corresponding to at least two of the different values. A different method includes comparing at least one pair of the aerial images corresponding to at least two of the different values and determining an area on the reticle where a lithography process using the reticle is most susceptible to failure based on the results of the comparison. Another embodiment includes determining a presence of transient repeating defects on the reticle by subtracting non-transient defects from the aerial images and comparing at least one pair of the aerial images corresponding to at least two of the different values. |
Author | PETERSON, Ingrid, B WILEY, Jim VON DEN HOFF, Mike |
Author_xml | – fullname: VON DEN HOFF, Mike – fullname: PETERSON, Ingrid, B – fullname: WILEY, Jim |
BookMark | eNqNjL0KwjAURjvo4N873BdwqMWCY5rcNBfSJCapaykSJ2kLdfDxreADOB34ON_ZZqthHNImewuUyCOQCW4hWQMNRmVFgKjYd-e6FQiMX1vyZGpg6IlpoIbVGMBKYOAxEtcI0noQJCV6NBE0LZ3aM6eIg_OWYwhwY8u70hj22frRP-d0-HGXgcTI1TFNY5fmqb-nIb06dPn5VJSXssqLP5QPd9s7MA |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences Physics |
DocumentTitleAlternate | PROCEDES D'INSPECTION DE DEFAUTS INCLUANT L'ACQUISITION D'IMAGES PROJETEES D'UN MASQUE POUR DIFFERENTES VARAIBLES DE PROCEDE LITHOGRAPHIQUE DEFEKTINSPEKTIONSMETHODEN, DIE DAS AUFNEHMEN DES PROJIZIERTEN MASKENABBILDES UNTER VERSCHIEDENEN LITHOGRAPHISCHEN PROZESSVARIABLEN BEINHALTEN |
ExternalDocumentID | EP1523696B1 |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_EP1523696B13 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 14:01:11 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English French German |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_EP1523696B13 |
Notes | Application Number: EP20030764592 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161221&DB=EPODOC&CC=EP&NR=1523696B1 |
ParticipantIDs | epo_espacenet_EP1523696B1 |
PublicationCentury | 2000 |
PublicationDate | 20161221 |
PublicationDateYYYYMMDD | 2016-12-21 |
PublicationDate_xml | – month: 12 year: 2016 text: 20161221 day: 21 |
PublicationDecade | 2010 |
PublicationYear | 2016 |
RelatedCompanies | KLA-Tencor Corporation |
RelatedCompanies_xml | – name: KLA-Tencor Corporation |
Score | 3.0724664 |
Snippet | Methods that include acquiring aerial images of a reticle for different values of a member of a set of lithographic variables are provided. One method also... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HANDLING RECORD CARRIERS HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRESENTATION OF DATA RECOGNITION OF DATA RECORD CARRIERS SEMICONDUCTOR DEVICES |
Title | DEFECT INSPECTION METHODS THAT INCLUDE ACQUIRING AERIAL IMAGES OF A RETICLE FOR DIFFERENT LITHOGRAPHIC PROCESS VARIABLES |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161221&DB=EPODOC&locale=&CC=EP&NR=1523696B1 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1Lb8IwDI4Qe942tmnsJR-m3qqpT-gBTWma0k4t7UpB3BDQInEpaHTafv6cCLZdtlvkqJYSy7G_9LNDyKNld0UaulCLTjFXTbN01JkmL-ANzS6W3WIpq1zjgR2MzJeJNWmQ1b4WRvYJ_ZDNEdGjFujvtTyvNz-XWJ7kVm6f5isUrZ_9vOcpO3SM6Yuua4rn9niaeAlTGMORMsjQsXXxcp2LQOlAZNGizT4fu6IoZfM7ovhn5DBFZVV9Thpl1SInbP_wWoscx7v_3S1yJAmaiy0Kd064vSCfHvc5ywFxd8olBwRingeJN4Q8oELOopHHgbLXUSjIDkARrdEIwpj2-RASHyhkPA9ZxAFBIHih7_OMD3KIQtTTz2gahAzSLGFoHhhT_NqN-PCSgM9zFqi4mOn3xk15-r1s44o0q3VVXhNAGziFbjj2zMLYbuBh3RF9txzNMcui07XapP2nmpt_5m7JqbCA4Hro2h1p1m_v5T1G7Hr-IPf6CzXij5c |
link.rule.ids | 230,309,786,891,25594,76903 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3NT8IwFG8IfuBNUSN-9mB2W8y-2YGYre3YdF-OQrgRYCPhMojM6J_vWwPoRW_Na_qS9uX19df-3itCj4bZrY-hczm38pms64UtTxVxAa8pZr7o5guR5RrFpj_UX8bGuIGWu1wYUSf0UxRHBI-ag79XYr9e_1xiUcGt3DzNliBaPXu8R6UtOobji6oqEnV7LE1oQiRCoCXFGTi2Wv9c5wJQOrAAEQqkNHLrpJT174jinaLDFJSV1RlqFGUbtcju47U2Oo62791tdCQImvMNCLdOuDlHX5R5jHAMuDtlggOCI8b9hA4w951aTsIhZdghb8OgJjtgB9CaE-IgcvpsgBMPOzhjPCAhwwACMQ08j2Us5jgMQE8_c1I_IDjNEgLmwSMHRrshG1wg7DFOfBkmM9kv3ISl-2lrl6hZrsriCmGwgZ2rmm1ODYjtGmzWVl13y1ZsvcitrtFBnT_VXP_T94BaPo_CSRjErzfopLZGzftQlVvUrN4_ijuI3tXsXqz7NxJHkoE |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=DEFECT+INSPECTION+METHODS+THAT+INCLUDE+ACQUIRING+AERIAL+IMAGES+OF+A+RETICLE+FOR+DIFFERENT+LITHOGRAPHIC+PROCESS+VARIABLES&rft.inventor=VON+DEN+HOFF%2C+Mike&rft.inventor=PETERSON%2C+Ingrid%2C+B&rft.inventor=WILEY%2C+Jim&rft.date=2016-12-21&rft.externalDBID=B1&rft.externalDocID=EP1523696B1 |