Stabilizers to inhibit the polymerization of substituted cyclotetrasiloxane
Stabilizing a cyclotetrasiloxane against polymerization used in a chemical vapor deposition process for silicon oxides in electronic material fabrication comprises providing a free radical polymerization inhibitor to the cyclotetrasiloxane. Stabilizing a cyclotetrasiloxane against polymerization use...
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Main Authors | , , , |
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Format | Patent |
Language | English French German |
Published |
20.06.2007
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Subjects | |
Online Access | Get full text |
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Summary: | Stabilizing a cyclotetrasiloxane against polymerization used in a chemical vapor deposition process for silicon oxides in electronic material fabrication comprises providing a free radical polymerization inhibitor to the cyclotetrasiloxane. Stabilizing a cyclotetrasiloxane against polymerization used in a chemical vapor deposition process for silicon oxides in electronic material fabrication comprises providing a free radical polymerization inhibitor to the cyclotetrasiloxane of formula (I). [Image] R 1>-R 7>H, 1-10C alkyl or 1-4C alkoxy. An independent claim is also included for a composition of a cyclotetrasiloxane stabilizing against polymerization used in a chemical vapor deposition process for silicon oxides in electronic material fabrication, comprising the cyclotetrasiloxane of formula (I) and a free radical scavenger polymerization inhibitor. |
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Bibliography: | Application Number: EP20040014368 |