Lithographic apparatus and device manufacturing method

• Main Authors: VAN MEER, ASCHWIN LODEWIJK HENDRICUS JOHANNES, VAN EMPEL, TJARKO ADRIAAN RUDOLF, ZAAL, KOEN JACOBUS JOHANNES MARIA, MIEDEMA, JAN REIN, OTTENS, JOOST JEROEN
• Format: Patent
• Language: English; French; German
• Published: 10.11.2004
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

A lithographic projection apparatus comprising: a radiation system (IL) for providing a projection beam (PB) of radiation; a support structure (MT) for supporting patterning means (MA), the patterning means serving to pattern the projection beam according to a desired pattern; a substrate holder (2) for holding a substrate (1) said substrate holder (2) provided with means to provide a holding force for pressing the substrate against the substrate holder; releasing means (4) for ejecting said substrate (1) from said holder (2) against said holding force; and a projection system for projecting the patterned beam onto a target portion of the substrate. According to the invention, the lithographic projection apparatus comprises a controller (5) for controlling said releasing means (4) so as to release said substrate (1) from said holder (2) with a release force that is reduced preceding to final release.