Radiation source, lithographic apparatus, and device manufacturing method

• Main Authors: KRIVTSUN, VLADIMIR MIHAILOVITCH, KOLOSHNIKOV, VSEVOLOD GRIGOREVITCH, LOOPSTRA, ERIK ROELOF, SIDELKOV, YURII VICTOROVITCH, KOSHELEV, KONSTANTIN NIKOLAEVITCH, IVANOV, VLADIMIR VITAL'EVITCH, BANINE, VADIM YEVGENYEVICH, KIEFT, ERIK RENE, STEVENS, LUCAS HENRICUS, JOHANNES, FRIJNS, OLAV WALDEMAR VLADIMIR, GAYAZOV, ROBERT RAFILEVITCH
• Format: Patent
• Language: English; French; German
• Published: 24.03.2004
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BLASTING; CINEMATOGRAPHY; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HEAT EXCHANGE IN GENERAL; HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS,IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT; HEATING; HOLOGRAPHY; LIGHTING; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES; MATERIALS THEREFOR; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MECHANICAL ENGINEERING; NANOTECHNOLOGY; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; TRANSPORTING; WEAPONS; X-RAY TECHNIQUE

A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. To improve heat dissipation, the radiation source comprises a plurality of discharge elements, each of which is only used for short intervals, after which another discharge element is selected. To improve the exact timing of the pinch formation and thus the pulse of EUV radiation, the radiation source comprises a triggering device. To improve the conversion efficiency, the radiation source is constructed to have a low inductance, and operated in a self-triggering regime.