THINNER FOR RINSING PHOTORESIST AND METHOD OF TREATING PHOTORESIST LAYER
A thinner for rinsing photoresist including 50 to 80 wt. % of n-butyl acetate, propylene glycol alkyl ether, and propylene glycol alkyl ether acetate, is provided. The thinner is neither toxic to humans nor ecologically undesirable and has no unpleasant odor. The waste solutions thereof and associat...
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| Main Authors | , , , , , |
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| Format | Patent |
| Language | English French German |
| Published |
18.09.2002
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| Edition | 7 |
| Subjects | |
| Online Access | Get full text |
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| Abstract | A thinner for rinsing photoresist including 50 to 80 wt. % of n-butyl acetate, propylene glycol alkyl ether, and propylene glycol alkyl ether acetate, is provided. The thinner is neither toxic to humans nor ecologically undesirable and has no unpleasant odor. The waste solutions thereof and associated waste water are easily handed so as to render this thinner environmental friendly. Additionally, the photoresist thinner of the present invention has excellent rinsing ability. |
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| AbstractList | A thinner for rinsing photoresist including 50 to 80 wt. % of n-butyl acetate, propylene glycol alkyl ether, and propylene glycol alkyl ether acetate, is provided. The thinner is neither toxic to humans nor ecologically undesirable and has no unpleasant odor. The waste solutions thereof and associated waste water are easily handed so as to render this thinner environmental friendly. Additionally, the photoresist thinner of the present invention has excellent rinsing ability. |
| Author | OH, SAE-TAE PARK, HONG-SICK KANG, SUNGUL LEE, YU-KYUNG JU, JIN-HO KANG, DOEK-MAN |
| Author_xml | – fullname: LEE, YU-KYUNG – fullname: OH, SAE-TAE – fullname: JU, JIN-HO – fullname: PARK, HONG-SICK – fullname: KANG, SUNGUL – fullname: KANG, DOEK-MAN |
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| DocumentTitleAlternate | VERDÜNNER ZUM SPÜLEN VON FOTORESISTS UND VERFAHREN ZUR BEHANDLUNG EINER RESISTSCHICHT DILUANT POUR LE RIN AGE DE LA PHOTORESINE ET PROCEDE DE TRAITEMENT D'UNE COUCHE DE PHOTORESINE |
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| Notes | Application Number: EP20000983526 |
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| RelatedCompanies | CLARIANT INTERNATIONAL LTD SAMSUNG ELECTRONICS CO., LTD |
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| Snippet | A thinner for rinsing photoresist including 50 to 80 wt. % of n-butyl acetate, propylene glycol alkyl ether, and propylene glycol alkyl ether acetate, is... |
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| SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| Title | THINNER FOR RINSING PHOTORESIST AND METHOD OF TREATING PHOTORESIST LAYER |
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