Electron beam-positive polyimide
An insoluble electron beam positive polyimide having the formula can be exposed by an electron beam to render the exposed areas soluble. The exposed areas can then be dissolved using a solvent to leave the pattern which can be used directly as an insulator layer in a semiconductor device.
Saved in:
| Main Authors | , , |
|---|---|
| Format | Patent |
| Language | English French German |
| Published |
01.08.1990
|
| Subjects | |
| Online Access | Get full text |
Cover
Loading…
| Abstract | An insoluble electron beam positive polyimide having the formula can be exposed by an electron beam to render the exposed areas soluble. The exposed areas can then be dissolved using a solvent to leave the pattern which can be used directly as an insulator layer in a semiconductor device. |
|---|---|
| AbstractList | An insoluble electron beam positive polyimide having the formula can be exposed by an electron beam to render the exposed areas soluble. The exposed areas can then be dissolved using a solvent to leave the pattern which can be used directly as an insulator layer in a semiconductor device. |
| Author | MOORE, JAMES A KAUFMAN, FRANK B DASHEFF, ANDREW N |
| Author_xml | – fullname: KAUFMAN, FRANK B – fullname: DASHEFF, ANDREW N – fullname: MOORE, JAMES A |
| BookMark | eNrjYmDJy89L5WRQcM1JTS4pys9TSEpNzNUtyC_OLMksS1UoyM-pzMzNTEnlYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxrgEGxuaWZsaWjkbGRCgBAP8yJvY |
| ContentType | Patent |
| DBID | EVB |
| DatabaseName | esp@cenet |
| DatabaseTitleList | |
| Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
| DeliveryMethod | fulltext_linktorsrc |
| Discipline | Medicine Chemistry Sciences Physics |
| DocumentTitleAlternate | Elektronenstrahl-empfindliches, positives Polyimid. Polyimide positif sensible à un rayonnement électronique. |
| ExternalDocumentID | EP0379639A2 |
| GroupedDBID | EVB |
| ID | FETCH-epo_espacenet_EP0379639A23 |
| IEDL.DBID | EVB |
| IngestDate | Fri Jul 19 12:39:48 EDT 2024 |
| IsOpenAccess | true |
| IsPeerReviewed | false |
| IsScholarly | false |
| Language | English French German |
| LinkModel | DirectLink |
| MergedId | FETCHMERGED-epo_espacenet_EP0379639A23 |
| Notes | Application Number: EP19890116346 |
| OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19900801&DB=EPODOC&CC=EP&NR=0379639A2 |
| ParticipantIDs | epo_espacenet_EP0379639A2 |
| PublicationCentury | 1900 |
| PublicationDate | 19900801 |
| PublicationDateYYYYMMDD | 1990-08-01 |
| PublicationDate_xml | – month: 08 year: 1990 text: 19900801 day: 01 |
| PublicationDecade | 1990 |
| PublicationYear | 1990 |
| RelatedCompanies | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| RelatedCompanies_xml | – name: INTERNATIONAL BUSINESS MACHINES CORPORATION |
| Score | 2.4054067 |
| Snippet | An insoluble electron beam positive polyimide having the formula can be exposed by an electron beam to render the exposed areas soluble. The exposed areas can... |
| SourceID | epo |
| SourceType | Open Access Repository |
| SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP |
| Title | Electron beam-positive polyimide |
| URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19900801&DB=EPODOC&locale=&CC=EP&NR=0379639A2 |
| hasFullText | 1 |
| inHoldings | 1 |
| isFullTextHit | |
| isPrint | |
| link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dS8MwED_G_HzTqji_6IP0Ldjapksfirh-MIRtRabsbSRdAoV9FFsV_3uvXTd90bdwgSQXch-5_C4HcMvvuUdtxYlluyZxFFOEKWqSmeVwbjoytWUVhxwM3f6L8zShkxZkm1yY-p_Qz_pzRJSoFOW9rPV1_hPECmtsZXEnMiStHuKxHxqzJl2scoAsI-z5UTIKR4ERBNgyhs--aXfxqHmPqK130IvuVuiv6LVXJaXkvy1KfAS7CQ62LI-hJZcaHASbwmsa7A-a924N9mqAZlogsRHC4gT0qCldowvJF2QNu_qQer6af2ULZOoU9DgaB32Ck063DE6jZLs8-wzaeO-X56BTSrlnpoIKlzmCcaZsqRQTaHPNrvBoBzp_DnPxT98lHFY7tUaxXUG7fHuX12hZS3FT78k3JVx86Q |
| link.rule.ids | 230,309,783,888,25578,76884 |
| linkProvider | European Patent Office |
| linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfR1dS8Mw8BjzY75pVTY_-yB9K7am6dKHIa7tmLpuQ6bsbSRdAgX3ga2K_95r101f9C1c4JI7ch9J7gPgit9wjxLFTZu4lukopkymqGVObYdzy5Exkfk7ZNR3u8_Ow5iOK5Csc2GKOqGfRXFElKgY5T0r9PXy5xErKGIr02uRIGhx2xm1AmNapovlDpBtBO1WOBwEA9_wfRwZ_aeWRZp41Lw71NZb6GGzvMx--NLOk1KWvy1KZx-2h4hsnh1ARc41qPnrxmsa7Eblf7cGO0WAZpwisBTC9BD0sGxdowvJZ-Yq7OpD6svF61cyQ6KOQO-EI79r4qKTDYGTcLjZHjmGKt77ZR10Sin3rFhQ4TJHMM4UkUoxgTbXagqPNqDxJ5qTf-YuodYdRb1J777_eAp7OddWEW1nUM3e3uU5WtlMXBT8-QYn4H_Z |
| openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Electron+beam-positive+polyimide&rft.inventor=KAUFMAN%2C+FRANK+B&rft.inventor=DASHEFF%2C+ANDREW+N&rft.inventor=MOORE%2C+JAMES+A&rft.date=1990-08-01&rft.externalDBID=A2&rft.externalDocID=EP0379639A2 |