Novel photosensitive resin compositions

A novel photosensitive resin composition, which has fairly high sensitivity to light and developable with water comprising of essential components a resin represented by the general formula (I), wherein X, which may be present or absent, represents an organic acid when it is present, Y stands for a...

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Bibliographic Details
Main Authors SHIMIZU, KIYOSHI, SERIZAWA, HAJIME, OJIMA, KOICHI
Format Patent
LanguageEnglish
French
German
Published 04.01.1989
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A novel photosensitive resin composition, which has fairly high sensitivity to light and developable with water comprising of essential components a resin represented by the general formula (I), wherein X, which may be present or absent, represents an organic acid when it is present, Y stands for a group containing carbon-carbon double bond(s) represented by the formula (II) or (III), -OCH2CH=CH [III] n is an integer of 10 or greater, j is a number defined as 0 < j < 1, and t is 0 or 1, and a sodium or potassium salt of 4,4'-diazidostilbene-2,2'-disulfonic acid represented by the general formula (IV), wherein z stands for sodium atom or potassium atom; or the resin represented by the general formula (I), the sodium or potassium salt of 4,4'-diazidostilbene-2,2'-disulfonic acid represented by the general formula (IV), and an aromatic ketone represented by the general formula (V), wherein G stands for hydrogen atom or an amino group or dialkylamino group represented by the general formula (VI), where u is 0, 1 or 2. o
Bibliography:Application Number: EP19870109403