Molecular-beam epitaxy apparatus

• Main Authors: KANAI, NORIO, TAMURA, NAOYUKI
• Format: Patent
• Language: English; French; German
• Published: 19.10.1988
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; SEMICONDUCTOR DEVICES; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS; THEIR RELEVANT APPARATUS; TRANSPORTING

A vacuum apparatus comprising a substrate setting disc 1 which is arranged in a conveyance chamber and on which substrates are placed, a drive system 34, 19, 21 which drives and rotates the disc 1, a cam 2 which is fixed to the disc 1, switching means 14a - 14d to switch signal circuits through the cam 2, calculation means 37, 43 to receive digital signals generated by the switching operations of the switching means 14a - 14d, signals from the drive system 34, 19, 21 and signals from respective processing devices so as to execute calculations, a memory 42 which registers calculated results, and a display unit 45 which displays the registered contents on a screen, rotational positions of the disc 1 being loaded so as to control the hysteretic aspects of the individual substrates within the conveyance chamber with the substrates at the respective positions and addresses held in correspondence.