RESIST STRUCTURE AND PROCESSES FOR MAKING AND PATTERNING IT
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| Main Authors | , , , , |
|---|---|
| Format | Patent |
| Language | English |
| Published |
04.05.1988
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| Edition | 4 |
| Subjects | |
| Online Access | Get full text |
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| Author | PEDERSON, LESTER ARLYN MILLER, ROBERT DENNIS HIRAOKA, HIROYUKI HOFER, DONALD CLIFFORD WILLSON, CARLTON GRANT |
|---|---|
| Author_xml | – fullname: PEDERSON, LESTER ARLYN – fullname: HOFER, DONALD CLIFFORD – fullname: MILLER, ROBERT DENNIS – fullname: WILLSON, CARLTON GRANT – fullname: HIRAOKA, HIROYUKI |
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| Notes | Application Number: EP19840105750 |
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| PublicationCentury | 1900 |
| PublicationDate | 19880504 |
| PublicationDateYYYYMMDD | 1988-05-04 |
| PublicationDate_xml | – month: 05 year: 1988 text: 19880504 day: 04 |
| PublicationDecade | 1980 |
| PublicationYear | 1988 |
| RelatedCompanies | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| RelatedCompanies_xml | – name: INTERNATIONAL BUSINESS MACHINES CORPORATION |
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| SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS SEMICONDUCTOR DEVICES |
| Title | RESIST STRUCTURE AND PROCESSES FOR MAKING AND PATTERNING IT |
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