Thin film production apparatus

• Main Authors: YANAI,AKIO, SHIRAHATA,RYUJI
• Format: Patent
• Language: English; German
• Published: 30.01.1986
• Edition: 4
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INDUCTANCES; INFORMATION STORAGE; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MAGNETS; METALLURGY; PHYSICS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSFORMERS

The present invention relates to a thin film production apparatus for applying a thin film to a moving ribbon-shaped base material by vacuum deposition with feed of gas into a vacuum system. A vacuum chamber is provided which has an evaporation source. The apparatus further contains a transport mechanism for moving the ribbon-shaped base material through the vacuum chamber, at least one channel for feeding the gas into the vacuum chamber, a plurality of nozzles, which are arranged near the ribbon-shaped base material within the vacuum chamber, and a multi-stage gas branching mechanism which is arranged between the channel and the nozzles.