VERFAHREN ZUM REAKTIVEN DC-PLASMATRON-SPUTTERN
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| Main Authors | , , , , , , , , |
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| Format | Patent |
| Language | German |
| Published |
12.10.1988
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| Edition | 4 |
| Subjects | |
| Online Access | Get full text |
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| Author | STRUEMPFEL,JOHANNES,DD HEISIG,ULLRICH,DD KORNDOERFER,CHRISTIAN,DD STEINFELDER,KARL,DD VETTERS,PETER,DD SCHNEIDER,SIEGFRIED,DD KIRCHHOFF,VOLKER,DD SCHILLER,SIEGFRIED,DD HILPRECHT,BERND,DD |
|---|---|
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| Notes | Application Number: DD19870304047 |
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| PublicationDateYYYYMMDD | 1988-10-12 |
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| PublicationDecade | 1980 |
| PublicationYear | 1988 |
| RelatedCompanies | FORSCHUNGSINSTITUT MANFRED VON ARDENNE,DD |
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| SubjectTerms | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| Title | VERFAHREN ZUM REAKTIVEN DC-PLASMATRON-SPUTTERN |
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