Degassing device for PVD (Physical Vapor Deposition) working cavity

• Main Authors: FENG CHEN, ZENG JUN, GAO FENG, CHANG CHUANDONG
• Format: Patent
• Language: Chinese; English
• Published: 19.03.2024
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The utility model relates to the technical field of semiconductor integrated circuit manufacturing, in particular to a degassing device for a PVD (Physical Vapor Deposition) deposition cavity, which comprises a degassing main pipe and a pressure regulating pipe, a main pipe control valve is arranged on the degassing main pipe; the pressure adjusting pipe comprises an outer pipe and an inner pipe located in the outer pipe. The air suction end of the outer pipe is connected with the degassing port of the PVD working cavity, and the air outlet end is communicated with the degassing main pipe; the inner pipe comprises a large-opening-degree inner pipe and a small-opening-degree inner pipe; the large-opening-degree inner pipe comprises a first opening end and a second opening end which are opposite to each other, the first opening end is an air suction end of the outer pipe, and the second opening end extends towards an air outlet end of the outer pipe and is suspended; the small-opening-degree inner pipe comprise