A process kit for substrate processing chamber and processing chamber

• Main Author: YOGANANDA SARODE VISHWANATH
• Format: Patent
• Language: Chinese; English
• Published: 03.03.2020
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY

A process kit for a substrate processing chamber and a processing chamber are provided. The process accessory includes an edge ring, an adjustable adjustment ring, and an actuation mechanism. The edgering has a first ring member that is in contact with a second ring member that is movable relative to the first ring member, forming a gap between the first ring member and the second ring member. The lower surface of the second ring member includes an upper alignment coupling, and the upper surface of the adjustable adjustment ring includes a lower alignment coupling. The lower alignment coupling of the adjustable adjustment ring is configured to mate with the upper alignment coupling of the second ring component to form an interface. And the actuating mechanism is connected with the lower surface of the adjustable adjusting ring. The actuation mechanism is configured to actuate the adjustable adjustment ring such that a gap between the first ring member and the second ring member changes. 提供了用于基板处理腔室的工艺配件和处理腔室。