Pattern manufacturing installation

• Main Author: OSHIMA EIJI
• Format: Patent
• Language: Chinese; English
• Published: 13.11.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The utility model discloses a pattern manufacturing installation. To patterning photocuring layer heating to shaping fast. Pattern manufacturing installation (100) are including controller (101), laser projector (102) and heater (103). Controller (101) control laser projector (102) patterned on plac...