Compound load normal position nanometer indentation testing arrangement of drawing - bending

• Main Authors: GUAN JIAN, LI LIJIA, XIAO HUIQIONG, ZHAO HONGWEI, YU YANG, XU HAILONG, YU MIAO, DU XIANCHENG
• Format: Patent
• Language: English
• Published: 03.02.2016
• Subjects: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; PHYSICS; TESTING

The utility model relates to a compound load normal position nanometer indentation testing arrangement of drawing - bending belongs to accurate scientific instrument and mechanics of materials testing machine field. The testing arrangement global architecture distributes for the cross, and by tensil...