Substrate processing method, substrate processing system and substrate processing apparatus

• Main Author: SHIGEMORI KAZUHITO,KANEYAMA KOJI,KANAOKA MASASHI,MIYAGI TADASHI,YASUDA SHUICHI
• Format: Patent
• Language: English
• Published: 04.07.2007
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

The invention relates to a method of processing substrate, substrate processing system and substrate processing apparatus. Immediately before or immediately after an alignment process for adjusting an exposure position of a pattern image in an exposure unit compatible with immersion exposure, a dumm...