Production of non-volatile memory

The method comprises: sequentially forming a bottom dielectric layer, a charge-trapped layer, a top dielectric layer and a conducting layer; removing a portion of said conducting layer, top dielectric layer, charge-trapped layer, bottom layer and substrate to form multi trenches; filling out insulat...

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Bibliographic Details
Main Author JIANLONG,ZHUANG ZHU
Format Patent
LanguageEnglish
Published 01.11.2006
Subjects
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