Method of fabricating semiconductor probe with resistive tip
Provided is a method of fabricating a semiconductor probe with a resistive tip. The method includes steps of forming a mask layer on a substrate doped with first impurities and forming first and second semiconductor electrode regions heavily doped with the second impurities on the substrate uncovere...
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Main Author | |
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Format | Patent |
Language | English |
Published |
26.04.2006
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Subjects | |
Online Access | Get full text |
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