Method for fabricating semiconductor device using tungsten as sacrificial hard mask
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| Main Author | |
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| Format | Patent |
| Language | English |
| Published |
19.04.2006
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| Subjects | |
| Online Access | Get full text |
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| Author | KIM KWANG-OK,CHO YUN-SEOK,MOON SEUNGAN,JUNG JIN-KI,LEE SUNG-KWON,SUN JUN-HYEUB,LEE DONG-DUK,KIM JIN-WOONG,YOON GYU-HAN |
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| Notes | Application Number: CN200510073045 |
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| PublicationDateYYYYMMDD | 2006-04-19 |
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| PublicationYear | 2006 |
| RelatedCompanies | HYNIX SEMICONDUCTOR INC |
| RelatedCompanies_xml | – name: HYNIX SEMICONDUCTOR INC |
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| SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| Title | Method for fabricating semiconductor device using tungsten as sacrificial hard mask |
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