Product support for vapour deposition apparatus

• Main Authors: TOCHISHITA YOSHIMI, OHTAGAKI KEN, FUJIWARA YOSHIO, ASAGAI YOSHIHIRO
• Format: Patent
• Language: English
• Published: 17.08.2005
• Edition: 7
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

In a process for surface-treating a plurality of works, the surfaces of the works are treated in a treating chamber, while being rotated about their axes, or about a rotational axis, or about their axes and about the rotational axis. The works are supported in a support member which may be comprised...