Method and apparatus for coating anti-corrosion liquid

• Main Author: TAKAMORI HIDEYUKI
• Format: Patent
• Language: English
• Published: 20.09.2006
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPARATUS SPECIALLY ADAPTED THEREFOR; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SEMICONDUCTOR DEVICES; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

PURPOSE: A resist coating method and apparatus are provided to improve the uniformity of a resist layer by restraining the resist layer from moving during a drying process using a clearance between independent coating regions. CONSTITUTION: A plurality of independent coating regions(E) are defined on a substrate(G). A clearance(d) exists between the coating regions. A resist solution is coated on the coating regions. A drying process is performed for the resultant structure under reduced pressure. At this time, the resist has a uniform thickness within each coating region because the clearance prevents the resist from flowing.