Electrode preparation and wafer forming of metal ion trap on glass

• Main Author: AMINI JAMES M
• Format: Patent
• Language: Chinese; English
• Published: 14.05.2024
• Subjects: CALCULATING; COMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS; COMPUTING; COUNTING; GAMMA RAY OR X-RAY MICROSCOPES; IRRADIATION DEVICES; NUCLEAR ENGINEERING; NUCLEAR PHYSICS; PHYSICS; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR

Techniques for making electrodes and shaping glass wafers or substrates (410) to produce metal ion traps (400, 500, 600) on glass are described. These ion traps may be configured with open light pathways and high aspect ratio trenches for electrodes. For example, a glass substrate may be shaped to provide a high numerical aperture (NA) light path by having angled cutouts (510), an electrode structure with high aspect ratio trenches, angled wire bonds (610, 620) for electrical connections, an angled wire bond to provide an additional clear path for one or more laser beams (520, 630), or any combination of these features. A quantum information processing (QIP) system (200) that may include an ion trap (270) having any of these features is also described. 描述了用于制造电极和成形玻璃晶片或基板(410)以生产玻璃上金属离子阱(400,500,600)的技术。这些离子阱可以被配置为具有开放的光通路和用于电极的高纵横比沟槽。例如，玻璃基板可以被成形为通过具有成角度切口(510)而提供高数值孔径(NA)光通路、具有高纵横比沟槽的电极结构、用于电连接的成角度的引线接合(610,620)、成角度的引线接合为一个或多个激光束(520,630)提供额外的畅通的通路、或这些特征的任何组合。还描述了可以包括具有这些特征中的任何特征的离子阱(270)的量子信息处理(QIP)系统(200)