Mask, and device and method for forming metal film using same

• Main Authors: HIGASHIKOZONO, SOUMA, KONDO HARUKI, INAGAKI KOJI, KURODA KEIJI
• Format: Patent
• Language: Chinese; English
• Published: 26.04.2024
• Subjects: APPARATUS THEREFOR; CHEMISTRY; ELECTROFORMING; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; METALLURGY; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS

Provided is a mask capable of forming a metal film (F) having a rectangular cross-sectional shape. The mask (60) is used for forming a metal film (F) of a predetermined pattern on the surface of a substrate (B) by electrolytic plating in a state in which the mask is pressed by an electrolyte membrane (13). A through portion (68) corresponding to the predetermined pattern is formed in the mask (60). At least a mask portion (65) of the mask material (60), which is in contact with the base material (B), is made of an elastic material. The through portion (68) has a widened portion (68a) that widens outward as it advances from a portion (68c) in contact with the substrate (B) in the thickness direction of the mask portion (65) such that the cross-sectional shape of a formation space (S) for forming the metal coating (F) of the through portion (68) becomes rectangular in a state in which the mask portion (65) is elastically deformed by the pressing force of the electrolyte membrane (13). 提供一种能够形成矩形截面形状的金属被膜(F)的掩模件