Ionized layer delay value fitting method
The invention discloses an ionosphere delay value fitting method. The method comprises the following steps: acquiring an ionosphere mask telegraph text and extracting a grid belt number and a grid point mask for an existing grid; determining whether the mask mark of the grid point in the mask list i...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
19.03.2024
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Subjects | |
Online Access | Get full text |
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Summary: | The invention discloses an ionosphere delay value fitting method. The method comprises the following steps: acquiring an ionosphere mask telegraph text and extracting a grid belt number and a grid point mask for an existing grid; determining whether the mask mark of the grid point in the mask list is valid based on the grid point mask in the ionized layer mask message and the binary number stored in the corresponding bit in the uniform grid list; obtaining an ionosphere delay message and extracting a grid belt number and a grid point ionosphere delay value; updating a delay value of a corresponding position in a delay list according to a grid point with an effective mask identifier in the mask list and a grid point ionosphere delay value in the ionosphere delay message; and for the south latitude or the north latitude, obtaining the ionosphere delay value of the auxiliary grid point, and obtaining the ionosphere delay value of the grid point of the non-existing grid at least based on the attribute of the unif |
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Bibliography: | Application Number: CN202410178392 |