Planetary plate with uniform heating function and graphite tray

• Main Authors: WANG JIANGBO, CHEN-ZHANG XIAOXIONG, XUE TAO, WANG QUN, GONG YIPIN
• Format: Patent
• Language: Chinese; English
• Published: 09.01.2024
• Subjects: AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; CRYSTAL GROWTH; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE; REFINING BY ZONE-MELTING OF MATERIAL; SEMICONDUCTOR DEVICES; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE; SINGLE-CRYSTAL-GROWTH; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL

The invention provides a planetary plate with a uniform heat function and a graphite tray, and belongs to the technical field of semiconductor preparation. The planetary plate comprises a disc piece and a circular ring piece. The disc piece comprises a base disc and a supporting disc, the base disc and the supporting disc are coaxially connected, and the outer diameter of the base disc is larger than that of the supporting disc; the circular ring piece comprises a limiting ring and an assembling ring, the limiting ring and the assembling ring are coaxially connected, and a plurality of notches are formed in the inner wall of the limiting ring and distributed at intervals in the circumferential direction of the inner wall of the limiting ring. According to the invention, the heating uniformity of the substrate can be effectively improved, so that the in-wafer wavelength uniformity of the prepared epitaxial wafer is ensured. 本公开提供了一种具有匀热功能的行星盘及石墨托盘，属于半导体制备技术领域。该行星盘包括：圆盘件和圆环件；圆盘件包括基盘和支撑盘，基盘与支撑盘同轴相连，且基盘的外径大于支撑盘的外