Balanced pathway and side seal for flat substrate edge to open volume contact

• Main Authors: KARIM, ISTAK, PASQUALE FRANK, KONKOLA PAUL, KIM SUNG-JAE, LEESER KARL, BALDASSERONI, CHLOE, MINSHALL EDMUND, CHANDRASEHARAN, RAMESH, SAKIYAMA YUKINORI, DUVALL ANDREW, SWAMINATHAN SHANKAR, BREILINGER, PATRICK, LAVOIE ADRIEN
• Format: Patent
• Language: Chinese; English
• Published: 10.11.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The invention provides a balanced pathway and side seal for contact of a flat substrate edge with an open volume, and specifically provides a susceptor for a substrate processing system that includes a susceptor body having a substrate-facing surface. The endless belt is disposed on a surface facing the substrate, the surface configured to support a radially outer edge of the substrate. A cavity is defined in the substrate-facing surface of the susceptor body and located radially inward of the endless belt. The cavity creates a volume between the bottom surface of the substrate and the substrate-facing surface of the susceptor body. A plurality of vent holes pass through the susceptor body and are in fluid communication with the cavity to equalize pressure on opposing faces of the substrate during processing. 本发明提供了平坦衬底边缘与开放体积接触的平衡途径和侧封，具体提供了用于衬底处理系统的基座，其包括具有面向衬底的表面的基座主体。环形带布置在面向衬底的表面上，该表面构造成支撑衬底的径向外边缘。腔被限定在基座主体的面向衬底的表面中并且位于环形带的径向内侧。腔在衬底的底表面和基座主体的面向衬底的表面之间产生体积。多个排气孔通过基座主体并且与腔流体连通，以在处理期间使衬底的相对面上的压力平衡。