Method for determining carrying reference of quartz wafer

• Main Authors: YANG HONGYONG, FU TINGXI, WEI MIAO, WU JUNHUA, YUAN DONGXIU
• Format: Patent
• Language: Chinese; English
• Published: 20.10.2023
• Subjects: BASIC ELECTRONIC CIRCUITRY; ELECTRICITY; IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; PHYSICS; RESONATORS; TESTING

The invention relates to the field of quartz crystal production, in particular to a quartz wafer carrying reference determination method, which comprises the following steps: S1, acquiring a base basic value of a quartz wafer; s2, establishing a reference screening threshold value by using the base basic value of the quartz wafer; and S3, completing the determination of the carrying reference of the quartz wafer according to the reference screening threshold value, avoiding the position fluctuation of the glue point and the wafer relative to the PAD caused by the position fluctuation of the valve ring and the PAD, enabling the positions of the glue point and the wafer relative to the PAD to be relatively unique, and improving the stability of a final product. 本发明涉及石英晶体生产领域，具体涉及一种用于石英晶片的搭载基准确定方法，包括：S1、获取石英晶片的基座基础数值；S2、利用所述石英晶片的基座基础数值建立基准筛选阈值；S3、根据所述基准筛选阈值完成石英晶片的搭载基准确定，规避了因可阀环与PAD的位置波动带来的胶点与晶片相对于PAD的位置波动，使胶点和晶片相对于PAD的位置相对唯一，从而提升最终产品的稳定性。