Multiple photomask alignment apparatus and alignment method for manufacturing fine metal mask for large area display

• Main Authors: RYU MYUNG-HOON, HAN DUK-KI, KIM JAE-BEOM
• Format: Patent
• Language: Chinese; English
• Published: 05.09.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The present invention relates to an apparatus and a method for aligning a plurality of photomasks for manufacturing a fine metal mask for a large-area display, and more particularly, to an apparatus for aligning a plurality of photomasks for manufacturing a fine metal mask for a large-area display,...