Multiple photomask alignment apparatus and alignment method for manufacturing fine metal mask for large area display

• Main Authors: RYU MYUNG-HOON, HAN DUK-KI, KIM JAE-BEOM
• Format: Patent
• Language: Chinese; English
• Published: 05.09.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The present invention relates to an apparatus and a method for aligning a plurality of photomasks for manufacturing a fine metal mask for a large-area display, and more particularly, to an apparatus for aligning a plurality of photomasks for manufacturing a fine metal mask for a large-area display, comprising: a photomask mounting bracket; the photomask adsorption part is formed on the edge of the photomask mounting bracket; an alignment reference part in which at least two alignment reference points are formed, the alignment reference points being located at positions overlapping the alignment marks; and an imaging device mounted at a position at which the overlapping state of the alignment reference portion and the alignment mark can be imaged, at least one of the alignment reference points overlapping with the alignment mark formed on a first photomask among the plurality of photomasks, and the remaining alignment reference points overlapping with the alignment mark formed on a second photomask, the second