Magnetic material shield near susceptor around plasma chamber

A plasma chamber includes: a chamber body having a processing region within the chamber body; a pad disposed on the chamber body, the pad surrounding the processing region; the substrate supporting piece is arranged in the liner; a magnet assembly including a plurality of magnets disposed around the...

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Main Authors PANDEY ANSHUL, DHANAKSHRUL ABHISHEK, KARRALL ASIT K, PINSON JAY D. II, KNOWLES JOSEPH JAMES G, GANTA SURESH S, ALAYAVALLI KETAN C, DUAN RENGUAN, NGUYEN ANDREW, LAI CANFENG, BERA KALLOL, SUN JENNIFER Y
Format Patent
LanguageChinese
English
Published 25.07.2023
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRICITY
INDUCTANCES
MAGNETS
SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
TRANSFORMERS
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Summary:A plasma chamber includes: a chamber body having a processing region within the chamber body; a pad disposed on the chamber body, the pad surrounding the processing region; the substrate supporting piece is arranged in the liner; a magnet assembly including a plurality of magnets disposed around the pad; and a magnetic material shield disposed around the pad, the magnetic material shield encapsulating a processing area proximate to the substrate support. 一种等离子体腔室包括：腔室主体，所述腔室主体具有在腔室主体内的处理区域；衬垫，所述衬垫设置在腔室主体上，所述衬垫围绕处理区域；基板支撑件，所述基板支撑件设置在衬垫内；磁体组件，所述磁体组件包括设置在衬垫周围的多个磁体；以及磁性材料屏蔽件，所述磁性材料屏蔽件设置在衬垫周围，所述磁性材料屏蔽件封装靠近基板支撑件的处理区域。
Bibliography:Application Number: CN202180079523