Method for reducing side falling rate of heavy rare earth coating
The invention relates to the field of heavy rare earth coating, in particular to a method for reducing the side falling rate of heavy rare earth coating. Comprising the following steps: processing a neodymium iron boron blank into a black sheet state, namely, processing the blank into a certain spec...
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Format | Patent |
Language | Chinese English |
Published |
07.07.2023
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Abstract | The invention relates to the field of heavy rare earth coating, in particular to a method for reducing the side falling rate of heavy rare earth coating. Comprising the following steps: processing a neodymium iron boron blank into a black sheet state, namely, processing the blank into a certain specification, and cleaning the surface of the blank; through a form of combining a material plate and a neodymium iron boron material, atoms in a non-constant area in an existing heavy rare earth coating technology are collected, through collection and statistics of atomic deposition distribution data and reasonable arrangement of transposition and repetition times, atomic deposition in the non-constant area is effectively utilized, the sputtering utilization rate is 85-90%, the side fall rate is reduced by 15-20%, and the sputtering efficiency is improved. The method improves the utilization rate of scarce resources, reduces the cost, improves the effective deposition utilization rate of the heavy rare earth target m |
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AbstractList | The invention relates to the field of heavy rare earth coating, in particular to a method for reducing the side falling rate of heavy rare earth coating. Comprising the following steps: processing a neodymium iron boron blank into a black sheet state, namely, processing the blank into a certain specification, and cleaning the surface of the blank; through a form of combining a material plate and a neodymium iron boron material, atoms in a non-constant area in an existing heavy rare earth coating technology are collected, through collection and statistics of atomic deposition distribution data and reasonable arrangement of transposition and repetition times, atomic deposition in the non-constant area is effectively utilized, the sputtering utilization rate is 85-90%, the side fall rate is reduced by 15-20%, and the sputtering efficiency is improved. The method improves the utilization rate of scarce resources, reduces the cost, improves the effective deposition utilization rate of the heavy rare earth target m |
Author | SHEN JIONG JIANG JINGJING LI GUOHUI XIANG CHUNTAO ZOU TIANPING ZHANG WEILONG |
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DocumentTitleAlternate | 一种降低重稀土镀膜旁落率的方法 |
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Notes | Application Number: CN202310682361 |
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Snippet | The invention relates to the field of heavy rare earth coating, in particular to a method for reducing the side falling rate of heavy rare earth coating.... |
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SubjectTerms | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INDUCTANCES INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MAGNETS METALLURGY SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSFORMERS |
Title | Method for reducing side falling rate of heavy rare earth coating |
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